One of the most common application of an electrochemical etching cell is a preparation of Nanocrystalline Porous Silicon Layer on a single crystal Si wafer.
To perform an electrochemical process, a square conducting sample is placed on the cell base, using a piece of aluminum foil as a back contact. The setup is sealed by an O-ring to prevent the electrolyte leakage. The cell is filed with an electrolyte and the wire electrode is immersed in the solution as a counter electrode. An electric current is passed between the aluminum back contact and the wire electrode for a certain amount of time. After the process, the cell elements should be washed several times with ethanol and dried under the nitrogen flow.
nominal exposure area: 1.20 cm2
electrolyte volume: 4.8 mL
minimum sample size: 20 mm x 20 mm
maximum sample width: 31 mm
1 cell base
1 cell top
1 set of O-rings
1 set of machine screws
This etch cell has been developed based on a design of Prof. Dr. Michael J. Sailor, published in Porous Silicon in Practice: Preparation, Characterization and Applications, Appendix A1. Etch Cell Engineering Diagrams and Schematics.